UNIVEX box coating systems
Our compact box coating systems allow direct access to the process chamber. Leybold UNIVEX box coating systems are defined by their chamber size.
- UNIVEX 250
- UNIVEX 400
- UNIVEX 600
- UNIVEX 900
UNIVEX 250
UNIVEX 250
Our compact box coating systems allow direct access to the process chamber. Leybold UNIVEX Box coating systems are defined by their chamber size.
Owing to its low height of only approximately 1.2 meters it is ideally placed on a benchtop. Substrates up to a max. overall diameter of 220 mm can be coated.
The system controller allows you to run manual, respectively semi-automatic coating processes.
Common applications:
- Contact metallization (evaporation of gold, silver, chromium, nickel, titanium, etc.)
- Contrast imaging for microscopy (indium, carbon, etc.)
- Thin film solar
Typical configurations
- Multi-pocket e-beam with thermal evaporator
- Up to two 2” sputter guns in confocal configuration for sputter up
UNIVEX 250 |
|
|---|---|
Chamber size |
width: 270 mm, depth: 370 mm, height: 400 mm |
Thermal evaporator |
up to 4 materials |
Organic evaporator |
up to 4 materials |
E-beam evaporation |
multi-pocket or single pocket |
Sputtering |
up or down, 2 x 2" |
Co-Deposition |
evaporation and/or sputtering |
Load lock compatible |
optional |
Water tempered chamber |
optional |
Vacuum level |
mid 10-7 mbar |
Cleanroom compatible |
yes |
UNIVEX 400
UNIVEX 400
The UNIVEX 400 is a compact coating system for laboratory tasks, respectively pilot production runs. Due to its chamber dimensions, it is ideal for coating of small to medium sized substrates.
Substrates / substrate holders up to an overall diameter of max. 350 mm can be coated.
The system controller allows you to run manual, semiautomatic and fully automatic coating processes.
Common applications
- Thin film solar: CdTe, CIGS, CZTS sputtered processes
- Organic electronics (PV, OLEDS)
- Optical coatings
- Microelectronics
Typical configurations
- Multi-pocket e-beam with thermal evaporator and ion source.
- Up to four 2” sputter guns in confocal configuration for sputter up or down
- E-beam and organics evaporators for inorganic-organic perovskite formation
UNIVEX 400 |
|
|---|---|
Chamber size |
width: 420 mm, depth: 480 mm, height: 550 mm |
Thermal evaporator |
up to 8 materials |
Organic evaporator |
up to 8 materials |
E-beam evaporation |
multi-pocket or single pocket |
Sputtering |
up or down, 4 X 2”, 3 X 3”, 2 X 4” or other |
Co-Deposition |
evaporation and/or sputtering |
Load lock compatible |
optional |
Ion assisted deposition |
optional |
Water tempered chamber |
yes |
Vacuum level |
mid 10-7 mbar |
UHV Version |
optional |
Cleanroom compatible |
yes |
UNIVEX 600
UNIVEX 600
The UNIVEX 600 is a compact coating system for the laboratory, respectively pilot production runs. Because of its chamber size it is suited for medium to large substrate sizes.
The attainable substrate throughput meets the general requirements for small series production runs. Substrates / substrate holders up to a max. overall diameter of 550 mm can be coated.
The system controller allows you to run manual, semi-automatic and fully automated coating processes.
Common applications
- Optical coatings
- Opto-electronic devices
- Resistive RAM
- High-temperature superconductors
Typical configurations
- Substrate heaters and/or coolers
- Multi-pocket e-beam with thermal evaporator and ion source.
- Palette, domed or planetary substrate configurations for single or multiple samples
- Multiple-sputter guns in confocal or face-to-face configuration
UNIVEX 600 |
|
|---|---|
Chamber size |
Width: 600 mm Depth: 600 mm Height: 800 mm or 550 mm (sputter) |
Thermal evaporator |
up to 8 materials |
Organic evaporator |
up to 8 materials |
E-beam evaporation |
multi-pocket and/or single pocket, multiple gun operation |
Sputtering |
up or down: 4 X 3”, 3 X 4”, 6 X 2” or other |
Co-Deposition |
evaporation and/or sputtering |
Load lock compatible |
optional |
Ion assisted deposition |
optional |
Water tempered chamber |
yes |
Vacuum level |
mid 10-7 mbar |
UHV Version |
optional |
Cleanroom compatible |
yes |
UNIVEX 900
UNIVEX 900
The UNIVEX 900 is the most sophisticated solution for medium to large substrate sizes, respectively for higher substrate throughputs. Substrates / substrate holders up to an overall diameter of 800 mm can be coated. The system controller allows you to run manual, semi-automatic and fully automated coating processes.
Common applications
- Optical coatings
- Opto-electronic devices
- Resistive RAM
- High-temperature superconductors
Typical configurations
- Substrate heaters and/or coolers
- Multi-pocket e-beam with ion-sources for substrate pre-clean and ion-assisted deposition
- Palette, domed or planetary substrate configurations for single or multiple samples
- Multiple-sputter guns in confocal or face-to-face configuration
UNIVEX 900 |
|
|---|---|
Chamber size |
Width: 900 mm Depth: 900 mm Height: 1100 mm |
Thermal evaporator |
up to 8 materials |
Organic evaporator |
up to 8 materials |
E-beam evaporation |
multi-pocket and/or single pocket, multiple gun operation |
Sputtering |
optional |
Co-Deposition |
yes |
Load lock compatible |
optional |
Ion assisted deposition |
optional |
Water tempered chamber |
yes |
Vacuum level |
mid 10-7 mbar |
UHV Version |
optional |
Cleanroom compatible |
yes |
UNIVEX 250
Our compact box coating systems allow direct access to the process chamber. Leybold UNIVEX Box coating systems are defined by their chamber size.
Owing to its low height of only approximately 1.2 meters it is ideally placed on a benchtop. Substrates up to a max. overall diameter of 220 mm can be coated.
The system controller allows you to run manual, respectively semi-automatic coating processes.
Common applications:
- Contact metallization (evaporation of gold, silver, chromium, nickel, titanium, etc.)
- Contrast imaging for microscopy (indium, carbon, etc.)
- Thin film solar
Typical configurations
- Multi-pocket e-beam with thermal evaporator
- Up to two 2” sputter guns in confocal configuration for sputter up
UNIVEX 250 |
|
|---|---|
Chamber size |
width: 270 mm, depth: 370 mm, height: 400 mm |
Thermal evaporator |
up to 4 materials |
Organic evaporator |
up to 4 materials |
E-beam evaporation |
multi-pocket or single pocket |
Sputtering |
up or down, 2 x 2" |
Co-Deposition |
evaporation and/or sputtering |
Load lock compatible |
optional |
Water tempered chamber |
optional |
Vacuum level |
mid 10-7 mbar |
Cleanroom compatible |
yes |
UNIVEX 400
The UNIVEX 400 is a compact coating system for laboratory tasks, respectively pilot production runs. Due to its chamber dimensions, it is ideal for coating of small to medium sized substrates.
Substrates / substrate holders up to an overall diameter of max. 350 mm can be coated.
The system controller allows you to run manual, semiautomatic and fully automatic coating processes.
Common applications
- Thin film solar: CdTe, CIGS, CZTS sputtered processes
- Organic electronics (PV, OLEDS)
- Optical coatings
- Microelectronics
Typical configurations
- Multi-pocket e-beam with thermal evaporator and ion source.
- Up to four 2” sputter guns in confocal configuration for sputter up or down
- E-beam and organics evaporators for inorganic-organic perovskite formation
UNIVEX 400 |
|
|---|---|
Chamber size |
width: 420 mm, depth: 480 mm, height: 550 mm |
Thermal evaporator |
up to 8 materials |
Organic evaporator |
up to 8 materials |
E-beam evaporation |
multi-pocket or single pocket |
Sputtering |
up or down, 4 X 2”, 3 X 3”, 2 X 4” or other |
Co-Deposition |
evaporation and/or sputtering |
Load lock compatible |
optional |
Ion assisted deposition |
optional |
Water tempered chamber |
yes |
Vacuum level |
mid 10-7 mbar |
UHV Version |
optional |
Cleanroom compatible |
yes |
UNIVEX 600
The UNIVEX 600 is a compact coating system for the laboratory, respectively pilot production runs. Because of its chamber size it is suited for medium to large substrate sizes.
The attainable substrate throughput meets the general requirements for small series production runs. Substrates / substrate holders up to a max. overall diameter of 550 mm can be coated.
The system controller allows you to run manual, semi-automatic and fully automated coating processes.
Common applications
- Optical coatings
- Opto-electronic devices
- Resistive RAM
- High-temperature superconductors
Typical configurations
- Substrate heaters and/or coolers
- Multi-pocket e-beam with thermal evaporator and ion source.
- Palette, domed or planetary substrate configurations for single or multiple samples
- Multiple-sputter guns in confocal or face-to-face configuration
UNIVEX 600 |
|
|---|---|
Chamber size |
Width: 600 mm Depth: 600 mm Height: 800 mm or 550 mm (sputter) |
Thermal evaporator |
up to 8 materials |
Organic evaporator |
up to 8 materials |
E-beam evaporation |
multi-pocket and/or single pocket, multiple gun operation |
Sputtering |
up or down: 4 X 3”, 3 X 4”, 6 X 2” or other |
Co-Deposition |
evaporation and/or sputtering |
Load lock compatible |
optional |
Ion assisted deposition |
optional |
Water tempered chamber |
yes |
Vacuum level |
mid 10-7 mbar |
UHV Version |
optional |
Cleanroom compatible |
yes |
UNIVEX 900
The UNIVEX 900 is the most sophisticated solution for medium to large substrate sizes, respectively for higher substrate throughputs. Substrates / substrate holders up to an overall diameter of 800 mm can be coated. The system controller allows you to run manual, semi-automatic and fully automated coating processes.
Common applications
- Optical coatings
- Opto-electronic devices
- Resistive RAM
- High-temperature superconductors
Typical configurations
- Substrate heaters and/or coolers
- Multi-pocket e-beam with ion-sources for substrate pre-clean and ion-assisted deposition
- Palette, domed or planetary substrate configurations for single or multiple samples
- Multiple-sputter guns in confocal or face-to-face configuration
UNIVEX 900 |
|
|---|---|
Chamber size |
Width: 900 mm Depth: 900 mm Height: 1100 mm |
Thermal evaporator |
up to 8 materials |
Organic evaporator |
up to 8 materials |
E-beam evaporation |
multi-pocket and/or single pocket, multiple gun operation |
Sputtering |
optional |
Co-Deposition |
yes |
Load lock compatible |
optional |
Ion assisted deposition |
optional |
Water tempered chamber |
yes |
Vacuum level |
mid 10-7 mbar |
UHV Version |
optional |
Cleanroom compatible |
yes |
