Ultra-high vacuum (UHV) is the vacuum regime characterised by pressures lower than about 10−9 mbar (or 10-7 Pa). Ultra-high vacuum conditions are necessary for many surface analytic techniques such as X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), Secondary ion mass spectrometry (SIMS) or Field Emission Microscopy (FEM). Also thin film growth and preparation techniques with stringent requirements for purity, such as molecular beam epitaxy (MBE) and atomic layer deposition (ALD) rely on UHV conditions. Beam lines of accelerators as well as gravitational wave detectors also operate under UHV conditions.These vacuum levels demand the use of special materials and pumping principles.
Leybold offers a broad range of advanced vacuum solutions for use in ambitious ultra-high vacuum applications. Our components, system solutions and after sales services have shown their benefits in major research centers worldwide.