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UNIVEX Box Coater family

UNIVEX

Box coatings systems

Our compact box coating systems allow direct access to the process chamber. Leybold UNIVEX box coating systems are defined by their chamber size.

Modular system design

Multi-purpose vacuum chamber

Convenient access to all installed equipment

Multiple deposition techniques in same chamber

Cleanroom compatible

UNIVEX 250

Our compact box coating systems allow direct access to the process chamber. Leybold UNIVEX Box coating systems are defined by their chamber size. 

Owing to its low height of only approximately 1.2 meters it is ideally placed on a benchtop. Substrates up to a max. overall diameter of 220 mm can be coated. 

The system controller allows you to run manual, respectively semi-automatic coating processes. 

Common applications:

  • Contact metallization (evaporation of gold, silver, chromium, nickel, titanium, etc.)
  • Contrast imaging for microscopy (indium, carbon, etc.)
  • Thin film solar

Typical configurations

  • Multi-pocket e-beam with thermal evaporator 
  • Up to two 2” sputter guns in confocal configuration for sputter up 
UNIVEX Coating Systems
 

UNIVEX 250

Chamber size

width: 270 mm depth: 370 mm height: 400 mm

Thermal evaporator

up to 4 materials

Organic evaporator

up to 4 materials

E-beam evaporation

multi-pocket or single pocket

Sputtering

up or down, 2 x 2"

Co-Deposition

evaporation and/or sputtering

Load lock compatible

optional

Water tempered chamber

optional

Vacuum level

mid 10-7 mbar

Cleanroom compatible

yes

UNIVEX 400

The UNIVEX 400 is a compact coating system for laboratory tasks, respectively pilot production runs. Due to its chamber dimensions, it is ideal for coating of small to medium sized substrates. 

Substrates / substrate holders up to an overall diameter of max. 350 mm can be coated. 

The system controller allows you to run manual, semiautomatic and fully automatic coating processes. 

 Common applications

  • Thin film solar: CdTe, CIGS, CZTS sputtered processes
  • Organic electronics (PV, OLEDS)
  • Optical coatings
  • Microelectronics

Typical configurations

  • Multi-pocket e-beam with thermal evaporator and ion source.
  • Up to four 2” sputter guns in confocal configuration for sputter up or down
  • E-beam and organics evaporators for inorganic-organic perovskite formation
UNIVEX Coating Systems
 

UNIVEX 400

Chamber size

Width: 420 mm Depth: 480 mm Height: 550 mm

Thermal evaporator

up to 8 materials

Organic evaporator

up to 8 materials

E-beam evaporation

multi-pocket or single pocket

Sputtering

Up or down, 4  X  2”, 3  X  3”, 2  X  4” or other

Co-Deposition

evaporation and/or sputtering

Load lock compatible

optional

Ion assisted deposition

optional

Water tempered chamber

yes

Vacuum level

mid 10-7 mbar

UHV Version

optional

Cleanroom compatible

yes

UNIVEX 600

The UNIVEX 600 is a compact coating system for the laboratory, respectively pilot production runs. Because of its chamber size it is suited for medium to large substrate sizes. 

The attainable substrate throughput meets the general requirements for small series production runs. Substrates / substrate holders up to a max. overall diameter of 550 mm can be coated. 

The system controller allows you to run manual, semi-automatic and fully automated coating processes. 

Common applications

  • Optical coatings
  • Opto-electronic devices
  • Resistive RAM
  • High-temperature superconductors

Typical configurations

  • Substrate heaters and/or coolers 
  • Multi-pocket e-beam with thermal evaporator and ion source.
  • Palette, domed or planetary substrate configurations for single or multiple samples
  • Multiple-sputter guns in confocal or face-to-face configuration
UNIVEX Coating Systems
 

UNIVEX 600

Chamber size

Width: 600 mm Depth: 600 mm Height: 800 mm or 550 mm (sputter)

Thermal evaporator

up to 8 materials

Organic evaporator

up to 8 materials

E-beam evaporation

multi-pocket and/or single pocket, multiple gun operation

Sputtering

up or down: 4 X 3”, 3 X 4”, 6 X 2” or other

Co-Deposition

evaporation and/or sputtering

Load lock compatible

optional

Ion assisted deposition

optional

Water tempered chamber

yes

Vacuum level

mid 10-7 mbar

UHV Version

optional

Cleanroom compatible

yes

UNIVEX 900

The UNIVEX 900 is the most sophisticated solution for medium to large substrate sizes, respectively for higher substrate throughputs. Substrates / substrate holders up to an overall diameter of 800 mm can be coated. The system controller allows you to run manual, semi-automatic and fully automated coating processes.

Common applications

  • Optical coatings
  • Opto-electronic devices
  • Resistive RAM
  • High-temperature superconductors

Typical configurations

  • Substrate heaters and/or coolers 
  • Multi-pocket e-beam with ion-sources for substrate pre-clean and ion-assisted deposition
  • Palette, domed or planetary substrate configurations for single or multiple samples
  • Multiple-sputter guns in confocal or face-to-face configuration
UNIVEX Coating Systems
 

UNIVEX 900

Chamber size

Width: 900 mm Depth: 900 mm Height: 1100 mm

Thermal evaporator

up to 8 materials

Organic evaporator

up to 8 materials

E-beam evaporation

multi-pocket and/or single pocket, multiple gun operation

Sputtering

optional

Co-Deposition

yes

Load lock compatible

optional

Ion assisted deposition

optional

Water tempered chamber

yes

Vacuum level

mid 10-7 mbar

UHV Version

optional

Cleanroom compatible

yes

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